Tsukuba, Japan

Takashi Nasuno


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2006

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1 patent (USPTO):

Title: **Innovations by Takashi Nasuno: A Look into Semiconductor Manufacturing**

Introduction

Takashi Nasuno, a prominent inventor based in Tsukuba, Japan, has made significant contributions to the field of semiconductor manufacturing. With a focus on enhancing the efficiency and effectiveness of semiconductor devices, he holds one patent that showcases his innovative approach in this technical domain.

Latest Patents

His notable patent, titled "Method of Manufacturing Semiconductor Device," details a sophisticated procedure for creating semiconductor devices. The invention involves the deposition of a first Chemical Vapor Deposition (CVD) dielectric layer on a semiconductor substrate. Following this, low-k layers are deposited in multiple steps to form a via-layer dielectric film and a wiring-layer dielectric film on the initial dielectric layer. Critical to this process is the immediate thermal treatment post-depositions, leading to the application of a second CVD dielectric layer atop the low-k materials. The process continues with the formation of a groove in the dielectric layers, followed by the deposition of a metal layer, which is subsequently refined through chemical mechanical polishing.

Career Highlights

Takashi Nasuno is currently employed at Renesas Technology Corporation, where he applies his expertise in semiconductor technology. His work primarily involves the development and implementation of innovative manufacturing techniques that push the boundaries of current semiconductor capabilities.

Collaborations

Throughout his career, Nasuno has collaborated with notable colleagues, including Seiichi Kondo and Kaori Misawa. These partnerships have facilitated a knowledge exchange that enhances the research and produces advancements within the semiconductor industry.

Conclusion

Takashi Nasuno stands out as a key innovator in semiconductor manufacturing. His patent presents a robust method that not only improves the efficiency of semiconductor devices but also shapes the future of manufacturing processes in this rapidly evolving field. His contributions, alongside his collaborations at Renesas Technology Corporation, underline the importance of innovative thinking and teamwork in advancing technology.

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