Wakayama, Japan

Takashi Morii


Average Co-Inventor Count = 5.7

ph-index = 2

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 2012-2019

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3 patents (USPTO):

Title: Takashi Morii: Innovator in Semiconductor Device Fabrication

Introduction

Takashi Morii is a prominent inventor based in Wakayama, Japan. He has made significant contributions to the field of semiconductor device fabrication, holding a total of 3 patents. His work focuses on improving lithographic overlay techniques, which are crucial for the precision required in modern electronics.

Latest Patents

One of Takashi Morii's latest patents is a method for PECVD overlay improvement. This patent relates to advancements in semiconductor device fabrication, specifically targeting improvements in lithographic overlay techniques. The method involves depositing a material on a substrate and heating it in a chamber using thermal energy. It includes measuring a local stress pattern of each substrate, which assesses changes in the depth of the deposited material. By plotting points on a k map, the local stress pattern is determined, and adjustments to the thermal energy are made accordingly. This innovative approach enhances the accuracy of semiconductor manufacturing processes.

Career Highlights

Takashi Morii is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His expertise in semiconductor device fabrication has positioned him as a valuable asset in the field. His contributions have not only advanced technology but have also paved the way for future innovations in semiconductor manufacturing.

Collaborations

Throughout his career, Takashi has collaborated with notable colleagues, including Kwangduk Douglas Lee and Yoichi Suzuki. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

In summary, Takashi Morii is a distinguished inventor whose work in semiconductor device fabrication has led to significant advancements in lithographic overlay techniques. His patents and collaborations reflect his commitment to innovation in the field.

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