Kanagawa, Japan

Takashi Kyouno

This inventor holds 1 USPTO granted patent. Top assignee: Renesas Electronics Corporation. Active years: 2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Takashi Kyouno. Retrieved from https://idiyas.com/inventor/takashi-kyouno

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 8.0

ph-index = 1


Company Filing History:


Years Active: 2015

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1 patent (USPTO):Explore Patents

Title: The Innovations of Takashi Kyouno

Introduction

Takashi Kyouno is a notable inventor based in Kanagawa, Japan. He has made significant contributions to the field of semiconductor technology. His innovative work has led to the development of a unique semiconductor device manufacturing method.

Latest Patents

Takashi Kyouno holds 1 patent for his invention related to semiconductor device manufacturing. The patent describes a method where a semiconductor wafer is placed over a stage that is kept in an as-heated state. After a specified time, a controller increases the pressure inside a vacuum chamber to a level higher than the initial pressure. This process ensures that the semiconductor wafer does not slide over protrusions, maintaining its position during manufacturing.

Career Highlights

Kyouno has established himself as a key figure in the semiconductor industry. His work at Renesas Electronics Corporation has been instrumental in advancing semiconductor manufacturing techniques. His innovative approach has garnered attention and respect within the field.

Collaborations

Takashi Kyouno has collaborated with several talented individuals, including Yoshitake Katou and Youichi Yamamoto. These collaborations have contributed to the success of his projects and the advancement of semiconductor technology.

Conclusion

In summary, Takashi Kyouno is a distinguished inventor whose work in semiconductor device manufacturing has made a significant impact. His innovative methods continue to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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