Takashi Kurimoto

Title: The Innovations of Takashi Kurimoto: Pioneering Methods in Semiconductor Technology

Introduction

Takashi Kurimoto, hailing from Hashima, Japan, is an accomplished inventor known for his significant contributions in the field of semiconductor technology. With a total of four patents to his name, his innovations are instrumental in advancing manufacturing techniques critical for modern electronics.

Latest Patents

Kurimoto's latest patents reflect his expertise and innovative thinking. One of his notable inventions is the "Ashing Method," which entails a sophisticated process for removing residual layers from semiconductor wafers. This method involves forming resist on an underlying layer, ion-implanting elements, and using a radical atmosphere inclusive of oxygen radicals for effective ashing. Additionally, he has developed a "Method of Dry Etching" using hydrogen bromide or bromine as an etching gas. This technique achieves precise control over vertical and taper etching, a critical requirement for achieving specific taper angles during semiconductor fabrication.

Career Highlights

Working at Fujitsu Corporation, Kurimoto has positioned himself as a leading figure in semiconductor research and development. His dedication to innovation has contributed significantly to Fujitsu's reputation in the electronics sector.

Collaborations

Throughout his career, Kurimoto has had the privilege of collaborating with esteemed colleagues such as Moritaka Nakamura and Katsuhiko Iizuka. Their combined expertise has facilitated groundbreaking advancements in the field of semiconductor processing.

Conclusion

Takashi Kurimoto's work exemplifies the spirit of innovation that drives the semiconductor industry forward. His pioneering patents and collaborations at Fujitsu Corporation not only enhance technological capabilities but also inspire future generations of inventors in the realm of electronics.