Takashi Koromokawa

Title: Innovations by Takashi Koromokawa

Introduction

Takashi Koromokawa is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His work focuses on methods that enhance the performance and efficiency of semiconductor devices.

Latest Patents

Koromokawa's latest patents include a film forming method and a semiconductor device manufacturing method. The film forming method involves creating an interlayer insulating film with a low dielectric constant to cover wiring. This process utilizes plasma to react a film forming gas, which includes alkoxy compounds and siloxanes with Si–H bonds, along with various oxygen-containing gases. The semiconductor device manufacturing method also emphasizes the formation of an interlayer insulating film, which is achieved by coating a substrate with a silicon-containing compound and subsequently forming a protective layer through plasma reactions.

Career Highlights

Throughout his career, Takashi Koromokawa has demonstrated a commitment to advancing semiconductor technology. His innovative approaches have led to the development of methods that improve the reliability and performance of semiconductor devices. His contributions are recognized within the industry, and he continues to be an influential figure in his field.

Collaborations

Koromokawa has worked alongside notable colleagues, including Taizo Oku and Junichi Aoki. Their collaborative efforts have furthered research and development in semiconductor technologies.

Conclusion

Takashi Koromokawa's work in semiconductor technology showcases his innovative spirit and dedication to improving electronic devices. His patents reflect a deep understanding of materials and processes that are crucial for the advancement of the industry.