Yokohama, Japan

Takashi Komine


Average Co-Inventor Count = 4.6

ph-index = 3

Forward Citations = 39(Granted Patents)


Company Filing History:


Years Active: 1979-1989

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3 patents (USPTO):Explore Patents

Title: Takashi Komine: Innovator in Photoresist Technology

Introduction

Takashi Komine is a notable inventor based in Yokohama, Japan. He has made significant contributions to the field of photoresist technology, particularly in the manufacturing of integrated circuits and electronic devices. With a total of 3 patents to his name, his work has paved the way for advancements in photolithography processes.

Latest Patents

Komine's latest patents include a method of forming a positive resist pattern in photoresist. This innovative dually photosensitive composition is useful in the manufacture of integrated circuits and similar electronic devices. It is positively photosensitive when exposed to ultraviolet light in a relatively small dose, but negatively photosensitive when exposed to a substantially larger dose or far ultraviolet light. This composition is created by admixing a positive-type photoresist material, which includes a novolac resin and an o-naphthoquinone diazide compound, with a bisazide compound such as 4,4'-diazidodiphenyl sulfide. The inventive photosensitive composition allows for the development of intricate techniques for patterning a photoresist layer on substrates, such as creating a checkboard-like patterned layer using a photomask of a line-and-space pattern.

Another significant patent by Komine is a positive-working O-quinone diazide photoresist composition. This invention improves upon conventional positive-working photoresist compositions that utilize a novolac resin and an ester compound. The improvement addresses issues related to scum formation during development and enhances the resistance of the patterned photoresist layer against heat and dry etching. The inventive composition includes, in addition to the novolac resin and ester compounds, 2,3,4-trihydroxybenzophenone in a specified amount, which is a reaction product obtained through the esterification reaction for synthesizing the ester compounds.

Career Highlights

Throughout his career, Takashi Komine has worked with prominent companies in the industry, including Tokyo Ohka Kogyo Co., Ltd. and Tokyo Ohka Kogyo Kabushiki Kaisha. His experience in these organizations has contributed to his expertise in photoresist technology and innovation.

Collaborations

Komine has collaborated with notable coworkers such as Akira Yokota and Hisashi Nakane. Their collective efforts have

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