Yokosuka, Japan

Takashi Kamimura

This inventor holds 10 USPTO granted patents. Top assignee: Hitachi, Ltd.. Active years: 1984-1998.


% Patents Active = 100.0

Average Co-Inventor Count = 5.7

ph-index = 10

Forward Citations = 386(Granted Patents)


Location History:

  • Yokohama, JP (1984 - 1993)
  • Yokosuka, JP (1996 - 1998)

Company Filing History:


Years Active: 1984-1998

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10 patents (USPTO):Explore Patents

Title: Takashi Kamimura: Innovator in Plasma Processing Technology

Introduction

Takashi Kamimura is a prominent inventor based in Yokosuka, Japan. He has made significant contributions to the field of plasma processing technology, holding a total of 10 patents. His work focuses on improving methods and apparatuses that utilize focused ion beams for various applications.

Latest Patents

One of Kamimura's latest patents is a processing method and apparatus using focused ion beam generating means. This innovative method employs a plasma ion source to generate a focused ion beam. It is characterized by the use of an insulator to cover the inner wall of a plasma holding vessel, excluding a reference electrode and an ion extraction electrode. The method allows for continuous control of the absolute value of the ion beam current, which ranges from 1 to 10 µA, by adjusting the ion extraction voltage between 0 to 100 V. This advancement stabilizes the ion beam current and prevents dimming, even when the current value changes.

Another notable patent is a plasma processing apparatus and processing method. This apparatus features a processing chamber with opposing windows for interior observation. It includes a plasma generation unit and a plasma light emission monitoring unit that observes the plasma light through one of the windows. A reference light irradiation unit is also included, which helps control the plasma processing state of the substrate by comparing monitored light emission data.

Career Highlights

Kamimura has built a successful career at Hitachi, Ltd., where he has been instrumental in advancing plasma processing technologies. His innovative approaches have led to significant improvements in the efficiency and effectiveness of plasma processing methods.

Collaborations

Throughout his career, Kamimura has collaborated with notable colleagues, including Fumikazu Itoh and Akira Shimase. These collaborations have further enhanced the development of cutting-edge technologies in the field.

Conclusion

Takashi Kamimura's contributions to plasma processing technology have established him as a leading inventor in his field. His innovative patents and collaborative efforts continue to influence advancements in technology.

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