Takao Izaki

Title: Takao Izaki: Innovator in Semiconductor Technology

Introduction

Takao Izaki is a prominent inventor based in Toyama-shi, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His innovative techniques have advanced the methods of processing substrates and manufacturing semiconductor devices.

Latest Patents

Izaki's latest patents include a method of processing substrates and a method of manufacturing semiconductor devices by forming films. The first patent outlines a technique that involves providing a substrate with a first and second surface. It details the modification of the first surface to be terminated with a hydrocarbon group by supplying a hydrocarbon group-containing gas. Following this, a film is formed on the second surface by supplying a precursor and an oxygen- and hydrogen-containing gas after the modification of the first surface. The second patent also focuses on substrate processing, where the surface of a first base is modified to be terminated with a hydrocarbon group, and a film is formed on a second base surface using similar gas supplies.

Career Highlights

Takao Izaki is currently employed at Kokusai Electric Corporation, where he continues to develop innovative solutions in semiconductor technology. His work has been instrumental in enhancing the efficiency and effectiveness of semiconductor manufacturing processes.

Collaborations

Izaki collaborates with notable colleagues, including Takayuki Waseda and Takashi Nakagawa. Their combined expertise contributes to the advancement of technology within their field.

Conclusion

Takao Izaki's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor. His work continues to shape the future of semiconductor manufacturing processes.