This inventor holds 3 USPTO granted patents. Top assignee: Hitachi Metals, Ltd.. Active years: 2011-2012.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2011-2012
Title: Takao Gotoh: Innovator in Flow Control Technology
Introduction
Takao Gotoh is a prominent inventor based in Mie, Japan. He has made significant contributions to the field of flow control technology, holding a total of 3 patents. His work focuses on enhancing the efficiency and accuracy of mass flow rate control systems, particularly in semiconductor manufacturing processes.
Latest Patents
One of his latest patents is a mass flow rate-controlling apparatus. This apparatus includes a mass flow rate-detecting mechanism, a flow rate-controlling valve mechanism, and a control mechanism that adjusts the valve based on external flow rate-setting signals and detected flow rate signals. The design also incorporates a pressure-detecting mechanism to monitor fluid pressure, allowing for two distinct control modes based on either flow rate signals or pressure signals.
Another notable patent is a flow controller and its associated test method. This invention enables the testing of flow control for process gases in semiconductor manufacturing. During operation, it collects test sampling information, including detected flow rates and pressure values, to ensure that the flow rate remains at the desired set value. The system also determines coefficients of association to maintain optimal flow control, providing valuable test information when deviations occur.
Career Highlights
Takao Gotoh is currently employed at Hitachi Metals, Ltd., where he continues to innovate in the field of flow control technology. His expertise has been instrumental in developing solutions that enhance the performance of semiconductor manufacturing equipment.
Collaborations
Throughout his career, Gotoh has collaborated with notable colleagues, including Tohru Matsuoka and Shigehiro Suzuki. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Takao Gotoh's contributions to flow control technology have made a significant impact in the semiconductor industry. His innovative patents and collaborative efforts continue to drive advancements in this critical field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile