Fukui, Japan

Takao Ebita

This inventor holds 1 USPTO granted patent. Top assignee: Seiren Company, Ltd. Active years: 2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Takao Ebita. Retrieved from https://idiyas.com/inventor/takao-ebita

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2010

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1 patent (USPTO):Explore Patents

Title: Takao Ebita: Innovator in Color Inspection Technology

Introduction

Takao Ebita is a notable inventor based in Fukui, Japan. He has made significant contributions to the field of color inspection technology, particularly in textile products. His innovative approach has led to the development of a system that enhances the accuracy of color inspections.

Latest Patents

Takao Ebita holds 1 patent for his invention of a color inspection system. This system is designed to determine pass or fail criteria with accuracy comparable to visual inspections. It is particularly effective for various textile products, including raised cloth and those with intricate printed patterns. The system utilizes a spectroradiometer to measure color values from a specific angle, ensuring precise evaluations.

Career Highlights

Ebita is associated with Seiren Company, Ltd., where he has applied his expertise in developing advanced inspection technologies. His work has significantly impacted the textile industry by providing reliable methods for quality control.

Collaborations

Some of his notable coworkers include Keiichirou Tabata and Norihiro Ogata. Their collaborative efforts have contributed to the success of various projects within the company.

Conclusion

Takao Ebita's contributions to color inspection technology exemplify the importance of innovation in ensuring quality in textile products. His work continues to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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