This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Jsr Corporation. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Takanori Yanagi: Innovator in Abrasive Grain Manufacturing
Introduction
Takanori Yanagi is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of chemical mechanical polishing through his innovative methods and compositions. His work is particularly relevant in the semiconductor industry, where precision and efficiency are paramount.
Latest Patents
Takanori Yanagi holds a patent for a "Method for manufacturing abrasive grains, composition for chemical mechanical polishing, and method for chemical mechanical polishing." This invention provides abrasive grains and a composition for chemical mechanical polishing that selectively polishes silicon nitride films. The method is also applicable to silicon oxide films, amorphous silicon films, and polysilicon films. The manufacturing process includes a first step of heating a mixture containing particles with a sulfanyl group fixed to their surface and a compound with carbon-carbon unsaturated double bonds. A second step involves adding a peroxide and further heating the mixture.
Career Highlights
Takanori Yanagi is associated with JSR Corporation, a leading company in the field of advanced materials. His work has been instrumental in developing innovative solutions that enhance the performance of semiconductor manufacturing processes. With a focus on precision and quality, Yanagi's contributions have positioned him as a key figure in his industry.
Collaborations
Takanori Yanagi has collaborated with notable colleagues, including Pengyu Wang and Kouji Nakanishi. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Takanori Yanagi's work in abrasive grain manufacturing and chemical mechanical polishing represents a significant advancement in semiconductor technology. His innovative methods and compositions continue to influence the industry, showcasing the importance of research and development in driving progress.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
