Takamasa Wakabayashi

Title: Takamasa Wakabayashi: Innovator in Semiconductor Technology

Introduction

Takamasa Wakabayashi is a prominent inventor based in Nagano, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on innovative manufacturing methods that enhance the performance and efficiency of semiconductor apparatus.

Latest Patents

Wakabayashi's latest patents include a manufacturing method of semiconductor apparatus. This method involves the formation of a screen oxide film on an n-drift layer, which is positioned on the anterior side of an n-type low-resistance layer. A nitride film is then created on the screen oxide film, which is subsequently photo-etched using a first mask to form a nitride shielding film. N-type impurity ions, at a concentration higher than that of the n-drift layer, are implanted through the nitride shielding film from the anterior side of a semiconductor substrate. This process leads to the thermal diffusion and formation of an n counter layer. Following the removal of the screen oxide film, a gate oxide film is formed, and a gate electrode is established on this gate oxide film. P-type impurity ions are implanted using the gate electrode and the nitride shielding film as a mask, resulting in the formation of p-well regions. Similarly, n-type impurity ions are implanted to create n source regions.

Career Highlights

Wakabayashi is currently employed at Fuji Electric Co., Ltd., where he continues to develop innovative semiconductor technologies. His expertise in the field has positioned him as a key player in advancing semiconductor manufacturing processes.

Collaborations

Throughout his career, Wakabayashi has collaborated with notable colleagues, including Yasushi Niimura and Sota Watanabe. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Takamasa Wakabayashi is a distinguished inventor whose work in semiconductor technology has led to significant advancements in the field. His innovative patents and collaborations with esteemed colleagues highlight his commitment to enhancing semiconductor manufacturing processes.