Takamasa Tanikuni

Title: Takamasa Tanikuni: Innovator in Semiconductor Technology

Introduction

Takamasa Tanikuni is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on improving manufacturing processes and enhancing device performance.

Latest Patents

Tanikuni's latest patents include a plasma processing apparatus, a semiconductor manufacturing apparatus, and an electrostatic chucking unit used thereof. The plasma processing apparatus features a wiring member that becomes substantially symmetrical on the plane of an electrostatic chuck unit. This design connects to the tip end of an RF introduction rod, ensuring uniform generation of an electric field due to bias RF, which mitigates plasma damage. His semiconductor manufacturing apparatus aims to improve interconnection lifetime while controlling resistance increases. By applying plasma treatment to the surface of a copper interconnection with a nitrogen-containing source gas, a copper nitride layer is formed, followed by a silicon nitride film. Underneath the copper nitride layer, a thin copper silicide layer is created, enhancing the overall stability of the manufacturing process.

Career Highlights

Throughout his career, Tanikuni has worked with notable companies such as NEC Electronics Corporation and NEC Corporation. His experience in these organizations has allowed him to develop innovative solutions that address critical challenges in semiconductor manufacturing.

Collaborations

Tanikuni has collaborated with esteemed colleagues, including Hidemitsu Aoki and Hiroaki Tomimori. Their combined expertise has contributed to advancements in the semiconductor industry.

Conclusion

Takamasa Tanikuni's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor. His work continues to impact the field, paving the way for future innovations in manufacturing processes.