Takahiro Tsunoda

Title: The Innovative Contributions of Takahiro Tsunoda

Introduction

Takahiro Tsunoda is a prominent inventor based in Funabashi, Japan. He has made significant contributions to the field of materials science, particularly in the development of advanced copolymers and photosensitive materials. With a total of 5 patents to his name, Tsunoda's work has garnered attention for its practical applications in various industries.

Latest Patents

One of Tsunoda's latest patents is a novel copolymer and photosensitive material that comprises units of a fluorine-containing acrylic monomer and units of an ethylenically unsaturated monomer with a photosensitive group. This copolymer exhibits excellent photosensitivity along with outstanding water and oil repellent properties. It is particularly useful as a photosensitive material for dry offset printing plates or as a photo-curable coating material. Another significant patent involves a copolymer that includes a monomer with a perfluoroalkyl or perfluoroalkenyl group and an ethylenically unsaturated group. This material also demonstrates excellent photosensitivity and is applicable in similar fields as the first patent.

Career Highlights

Throughout his career, Takahiro Tsunoda has worked with notable companies such as Daikin Kogyo Co., Ltd. and Nippon Paint Company, Ltd. His experience in these organizations has allowed him to refine his expertise in polymer chemistry and materials development.

Collaborations

Tsunoda has collaborated with esteemed colleagues, including Tsuguo Yamaoka and Sinji Tamaru. These partnerships have contributed to the advancement of his research and the successful development of innovative materials.

Conclusion

Takahiro Tsunoda's contributions to the field of materials science through his patents and collaborations highlight his role as a leading inventor. His work continues to influence various applications in industry, showcasing the importance of innovation in advancing technology.