Daikin Kogyo Co., Ltd.

Nippon Paint Compnay, Ltd.

Murakami Screen Kabushiki Kaisha

Takahiro Tsunoda

Tsuguo Yamaoka

Sinji Tamaru

Nobuyuki Tomihashi

Akira Ohmori

Shin Saito

Sadayoshi Kaneda

Sinji Tamura

A copolymer comprising (a) units of a fluorine-containing acrylic monomer having a general formula ##STR1## wherein X is F or CF.sub.3, Y is H or CH.sub.3, n is an integer of 2 to 7, and (b) units of an ethylenically unsaturated monomer having a photosensitive group. The copolymer has an excellent photosensitivity and excellent water and oil repellent properties, and is useful for example as a photosensitive material for dry offset printing plate or resist and as a photo-curable, water and oil repelling coating material.

Novel copolymer and photosensitive material containing the same

A copolymer comprising (a) a monomer having a C.sub.7 to C.sub.21 perfluoroalkyl or perfluoroalkenyl group at one end of the molecule and an ethylenically unsaturated group at the other end of the molecule, and (b) a monomer having a photosensitive group, e.g. an azidobenzoyloxy group, cinnamoyloxy group, benzoylphenyl group or .alpha.,.beta.-unsaturated ketone group. The copolymer has an excellent photosensitivity and excellent water and oil repellent properties, and is useful for various purposes, e.g. as a photosensitive material for dry offset printing plate or resist and as a photo-curable, water and oil repelling coating material.

Photosensitive material

A fluoroalkyl acrylate copolymer comprising recurring units of the general formula (I): ##STR1## wherein R.sub.1 is hydrogen atom or methyl group, R.sub.2 is a bivalent hydrocarbon group and R.sub.f is a C.sub.2 to C.sub.6 straight or branched perfluoroalkyl group or a C.sub.2 to C.sub.6 straight or branched fluoroalkyl group having hydrogen atoms of not less than one and of not more than half of the number of the carbon atoms, and recurring units of the general formula (II): ##STR2## wherein R.sub.3 is hydrogen atom or methyl group and R.sub.4 is a bivalent hydrocarbon group or a mono-substituted bivalent hydrocarbon group with hydroxyl group or a halogen except fluorine. The copolymer is curable with light and energy rays, and is suitable as a material sensitive thereto for use in resist, dry lithographic printing plate and paint.

Fluoroalkyl acrylate copolymer and composition containing the same

The photosensitive composition contains a water-soluble graft copolymer of a partially hydrolyzed polyvinyl acetate grafted with acrylonitrile and optionally another vinylic monomer, a polymeric emulsion and a diazo compound. This composition possesses high resistance to solvent, abrasion and moisture and a favorable water-dissolubility as well.

Photosensitive diazo composition with graft copolymer for use in

A photosensitive composition in solution for printing screens which comprises: (a) a liquid medium selected from the group consisting of water-miscible organic solvents and solvent mixtures of said organic solvents and water; (b) a polymer soluble in both said organic solvents and water; and (c) a sensitizer soluble in said organic solvents which is selected from the group consisting of photosensitive monomers and prepolymers thereof. This composition makes it possible to produce presensitized printing screens of excellent preservability and printing resistance and to provide a process for efficiently producing pre-sensitized printing screens.

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Funabashi, Japan

Takahiro Tsunoda