Kanagawa, Japan

Takahiro Matsuno


Average Co-Inventor Count = 3.6

ph-index = 2

Forward Citations = 14(Granted Patents)


Location History:

  • Kanagawa, JP (2002 - 2005)
  • Minami-Ashigara, JP (2008)
  • Ashigarakami-gun, JP (2011)

Company Filing History:


Years Active: 2002-2011

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8 patents (USPTO):

Title: The Innovative Contributions of Takahiro Matsuno

Introduction

Takahiro Matsuno is a prominent inventor based in Kanagawa, Japan. He has made significant contributions to the field of semiconductor manufacturing and photographic materials. With a total of 8 patents to his name, Matsuno's work has had a lasting impact on technology and innovation.

Latest Patents

Matsuno's latest patents include a metal-polishing liquid and polishing method designed for chemical-mechanical polishing of conductor films made of copper or copper alloys. This innovative metal-polishing liquid comprises an amino acid derivative and a surfactant, which enhances the efficiency of the polishing process in semiconductor device manufacturing. Another notable patent is for a silver halide photographic light-sensitive material. This invention features a support with at least one silver halide emulsion layer, which contains silver halide grains with a high silver chloride content, along with a metal complex that serves as a ligand.

Career Highlights

Throughout his career, Matsuno has worked with renowned companies such as Fuji Photo Film Company, Limited and Fujifilm Corporation. His experience in these organizations has allowed him to develop and refine his innovative ideas, contributing to advancements in both the semiconductor and photographic industries.

Collaborations

Matsuno has collaborated with notable coworkers, including Tadanobu Sato and Tadashi Inaba. These partnerships have fostered a creative environment that has led to the development of groundbreaking technologies.

Conclusion

Takahiro Matsuno's contributions to innovation in semiconductor manufacturing and photographic materials are commendable. His patents reflect a deep understanding of the technical challenges in these fields, and his collaborations have further enhanced his impact on technology.

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