Fuji Photo Film Company, Limited

Fujifilm Corporation

Takahiro Matsuno

Tadanobu Sato

Tadashi Inaba

Tomonori Owaki

Makoto Kikuchi

Kohzaburoh Yamada

Kazutaka Takahashi

Masaru Takasaki

Takamitsu Tomiga

Toru Yamada

A metal-polishing liquid used for chemical-mechanical polishing of a conductor film of copper or a copper alloy in a process for manufacturing a semiconductor device, the metal-polishing liquid comprising: (1) an amino acid derivative represented by the formula (I); and (2) a surfactant, wherein, in the formula (I), Rrepresents an alkyl group having 1 to 4 carbon atoms and Rrepresents an alkylene group having 1 to 4 carbon atoms.

Metal-polishing liquid and polishing method

The present invention provides a silver halide photographic light-sensitive material comprising a support having thereon at least one silver halide emulsion layer, wherein the silver halide emulsion contained in the silver halide emulsion layer comprises silver halide grains having a silver chloride content of 90 mol % or more, and the silver halide emulsion further contains a metal complex having HO as a ligand. It also provides a silver halide photographic light-sensitive material comprising a support having thereon at least one silver halide emulsion layer, wherein the silver halide emulsion contained in the silver halide emulsion layer contains a metal complex having Oas a ligand.

Silver halide photographic light-sensitive material

Provided are a silver halide photographic emulsion containing a metal complex represented by the following formula (I):M[IrCl(L)(L)]&#x2003;&#x2003;(I)wherein, M represents a cation or anion, m represents an integer of 0 to 4, n represents an integer of 3 to 5, k represents an integer of 0 to 3, Lrepresents a ligand selected from the group consisting of pyrroles, thiophenes, pyrazoles, isoxazoles, isothiazoles, imidazole, oxazoles, furazanes, heterocycles having at least 3 hetero atoms and ureas, Lrepresents an inorganic ligand other than Cl with the proviso that when k represents 0, Lrepresents none of F, Br, I, NO, HO, CO and CO; and a metal complex represented by the following formula (IV):N[IrXQ]&#x2003;&#x2003;(IV)wherein, N represents a counter cation; X represents a halogen ion; Q represents a compound which contains at least three atoms selected from nitrogen and sulfur atoms, and 5 or less carbon atoms, may contain another atom, and exhibits a ratio of (the number of carbon atoms)/(the total number of nitrogen atoms+oxygen atoms+sulfur atoms) of less than 0.5; n' represents an integer of 1 or 2 and k&#x2032; represents the number of counter cations necessary for neutralizing the charge of a complex salt.

Silver halide photographic emulsion, silver halide photosensitive material, and novel iridium complex and preparation process thereof

A light-sensitive silver halide grain containing at least one metal complex, wherein when an a-axis, a b-axis and a c-axis of a silver halide crystal lattice are each established taking as an origin a central metal of the metal complex incorporated into the silver halide grain, the metal complex has in a ligand thereof a site which can form any bond of a covalent bond, a dative bond and an ionic bond, or a bond in a mixed form of these bonds with a silver ion on a lattice point which does not exist on any of the a-axis, the b-axis and the c-axis. The silver halide photographic material has no reciprocity failure over a wide range of exposure illuminations without desensitization and decrease of contrast on the low intensity side.

Light-sensitive silver halide grain and silver halide emulsion

Silver halide photographic material

The Silver halide grains in the silver halide emulsion is disclosed, comprising silver halide grains containing three or more kinds of transition metal complexes each having a different electron-releasing time respectively classified into any of Class A (100 seconds or more), Class B (more than 1/10 seconds and less than 100 seconds), Class C (more than 1/1000 seconds and 1/10 seconds or less) and Class D (1/1000 seconds or less).

Silver halide emulsion

The present invention provides a silver halide photographic light-sensitive material comprising a support having thereon at least one silver halide emulsion layer, wherein the silver halide emulsion contained in the silver halide emulsion layer comprises silver halide grains having a silver chloride content of 90 mol % or more, and the silver halide emulsion further contains a metal complex having H O as a ligand. It also provides a silver halide photographic light-sensitive material comprising a support having thereon at least one silver halide emulsion layer, wherein the silver halide emulsion contained in the silver halide emulsion layer contains a metal complex having O as a ligand.

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Kanagawa, Japan

Takahiro Matsuno