Kochi, Japan

Takahiro Hiramatsu



Average Co-Inventor Count = 5.9

ph-index = 5

Forward Citations = 826(Granted Patents)


Company Filing History:


Years Active: 2009-2011

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5 patents (USPTO):Explore Patents

Title: Takahiro Hiramatsu: Innovator in Semiconductor Technology

Introduction

Takahiro Hiramatsu is a prominent inventor based in Kochi, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 5 patents. His work focuses on innovative manufacturing methods that enhance the performance and efficiency of semiconductor devices.

Latest Patents

Hiramatsu's latest patents include a manufacturing method of a semiconductor device that incorporates an active layer of zinc oxide with controlled crystal lattice spacing. This method involves forming an oxide semiconductor thin film layer of zinc oxide, ensuring that a portion of the layer has lattice planes with a preferred orientation and a lattice spacing of at least 2.619 Å. Another notable patent is for a manufacturing method of a thin film transistor that includes low resistance conductive thin films. This method outlines the process of forming source/drain electrodes on a substrate, creating low resistance conductive thin films, and integrating an oxide semiconductor thin film layer to function as a channel.

Career Highlights

Throughout his career, Hiramatsu has worked with notable organizations such as the Kochi Industrial Promotion Center and Casio Computer Co., Ltd. His experience in these institutions has allowed him to refine his skills and contribute to advancements in semiconductor technology.

Collaborations

Hiramatsu has collaborated with esteemed colleagues, including Takashi Hirao and Mamoru Furuta. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.

Conclusion

Takahiro Hiramatsu is a key figure in the semiconductor industry, with a focus on innovative manufacturing methods that push the boundaries of technology. His contributions continue to influence the field and pave the way for future advancements.

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