Company Filing History:
Years Active: 2021-2022
Title: Takahide Hirasaki: Innovator in Nitride-Based Film Structures
Introduction
Takahide Hirasaki is a notable inventor based in Kanagawa, Japan. He has made significant contributions to the field of materials science, particularly in the development of nitride-based film structures. With a total of 2 patents, Hirasaki's work has implications for various technological applications.
Latest Patents
Hirasaki's latest patents include a composite nitride-based film structure and a sputtering method for thin film formation. The composite nitride-based film structure features a bulk single crystal, a plurality of nitride microcrystals, and an amorphous nitride thin film. This innovative structure allows for a specific orientation relationship between the nitride microcrystals and the bulk single crystal. The sputtering method involves narrowing down film deposition conditions by focusing on a nitriding process, enhancing the efficiency of thin film formation.
Career Highlights
Hirasaki is currently associated with Panasonic Intellectual Property Management Co., Ltd., where he continues to push the boundaries of innovation in his field. His work has garnered attention for its potential applications in various industries, including electronics and materials engineering.
Collaborations
Hirasaki has collaborated with notable colleagues such as Takafumi Okuma and Daisuke Suetsugu. These partnerships have contributed to the advancement of research and development in nitride-based technologies.
Conclusion
Takahide Hirasaki's contributions to the field of nitride-based film structures exemplify the importance of innovation in materials science. His patents reflect a commitment to advancing technology and improving manufacturing processes.