This inventor holds 4 USPTO granted patents. Top assignee: Asahi Kasei Kabushiki Kaisha. Active years: 2002-2009.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2002-2009
Title: Takaaki Ioka: Innovator in Antireflection Technology
Introduction
Takaaki Ioka is a prominent inventor based in Fuji, Japan. He has made significant contributions to the field of materials science, particularly in the development of antireflection films and coating compositions. With a total of 4 patents to his name, Ioka continues to push the boundaries of innovation in his industry.
Latest Patents
Ioka's latest patents include an antireflection film that comprises silica particles and at least one binder compound. This film features a silica particle content of 30% by weight or more, an arithmetic mean surface roughness (Ra) of not more than 2 nm, and a surface silicon atom content of 10 atom % or more. Another notable patent is a coating composition designed for forming low-refractive index thin layers. This composition includes a fluid, silica precursor obtained through hydrolysis and polycondensation of alkoxysilanes in the presence of an acid catalyst, along with a basic compound and an organic compound that is compatible with the silica precursor.
Career Highlights
Takaaki Ioka is currently employed at Asahi Kasei Kabushiki Kaisha, where he applies his expertise in materials science to develop innovative solutions. His work has been instrumental in advancing the company's capabilities in producing high-performance materials.
Collaborations
Ioka collaborates with talented coworkers such as Tsuneaki Tanabe and Hiroyuki Hanahata. Together, they contribute to the research and development efforts at Asahi Kasei, fostering a collaborative environment that encourages innovation.
Conclusion
Takaaki Ioka is a distinguished inventor whose work in antireflection technology and coating compositions has made a significant impact in his field. His ongoing contributions continue to inspire advancements in materials science.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile