This inventor holds 2 USPTO granted patents. Top assignee: Tokyo Electron Limited. Active years: 2017.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2017
Title: Taizo Okada: Innovator in Plasma Processing Technology
Introduction
Taizo Okada is a prominent inventor based in Miyagi, Japan. He has made significant contributions to the field of plasma processing technology, holding 2 patents that showcase his innovative approach to engineering.
Latest Patents
One of his latest patents is a plasma processing apparatus designed to excite a processing gas using microwave technology. This apparatus features a focus ring that extends in an annular shape, a first tubular member wrapped around a central axis, and an annular member made of dielectric material positioned between the focus ring and the first tubular member. Additionally, it includes a choke portion that suppresses microwave propagation through the first tubular member, enhancing the efficiency of the device.
Another notable patent is a plasma processing apparatus that incorporates a mounting table with a lower electrode and an electrostatic chuck. This system is equipped with a high-frequency power supply connected to the lower electrode, a heater within the electrostatic chuck, and a filter unit that ensures optimal performance. The choke portion in this design serves to suppress microwave propagation, further improving the apparatus's functionality.
Career Highlights
Taizo Okada is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work has been instrumental in advancing plasma processing technologies, which are crucial for various applications in electronics and materials science.
Collaborations
Throughout his career, Okada has collaborated with notable colleagues, including Masayuki Shintaku and Takashi Suzuki. These partnerships have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.
Conclusion
Taizo Okada's contributions to plasma processing technology exemplify his dedication to innovation and engineering excellence. His patents reflect a deep understanding of the complexities involved in plasma systems, positioning him as a key figure in the field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile