Nara, Japan

Taisuke Murata

This inventor holds 1 USPTO granted patent. Top assignees: Hitachi High-Tech Corporation, National Institutes for Cultural Heritage. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Taisuke Murata. Retrieved from https://idiyas.com/inventor/taisuke-murata-bxc2dygq

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Taisuke Murata: Innovator in Particle Size Distribution Measurement

Introduction

Taisuke Murata is a notable inventor based in Nara, Japan. He has made significant contributions to the field of particle size distribution measurement. His innovative work has led to the development of a unique method and device that enhances the accuracy of particle size analysis.

Latest Patents

Taisuke Murata holds a patent for a "Particle size distribution measurement method, particle size distribution measurement device, and calculation device." This patent outlines a comprehensive approach that includes an image acquisition step, a statistical value calculation step, and a measurement step. The method utilizes CT imaging to analyze granules in a target sample, providing precise measurements of particle size distribution.

Career Highlights

Throughout his career, Taisuke Murata has worked with prominent organizations, including Hitachi High-Tech Corporation and the National Institutes for Cultural Heritage. His experience in these institutions has allowed him to refine his skills and contribute to advancements in measurement technologies.

Collaborations

Taisuke Murata has collaborated with Hiroyuki Takagi, further enhancing the impact of his work in the field of particle size measurement.

Conclusion

Taisuke Murata's innovative contributions to particle size distribution measurement demonstrate his expertise and commitment to advancing technology in this area. His patent and career achievements reflect his significant role in the scientific community.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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