Kawasaki, Japan

Taira Okabe

This inventor holds 2 USPTO granted patents and 7 published patent applications. Top assignee: Asm IP Holding B.v.. Active years: 2025-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Taira Okabe. Retrieved from https://idiyas.com/inventor/taira-okabe

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 2 

% Patents Active = 100.0

Average Co-Inventor Count = 1.8

ph-index = 1


Company Filing History:


Years Active: 2025-2026

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2 patents (USPTO):Explore Patents

Title: Taira Okabe: Innovator in Substrate Processing Technology

Introduction

Taira Okabe is a prominent inventor based in Kawasaki, Japan. He has made significant contributions to the field of substrate processing technology, holding a total of 2 patents. His work focuses on developing advanced end effectors that enhance the efficiency and effectiveness of substrate handling.

Latest Patents

Among his latest innovations is the patent for an end effector and substrate processing apparatus, which includes a substrate-supporting body designed to hold the substrate securely. This exemplary end effector features a first array of wave generators that are strategically placed within the substrate-supporting body. These wave generators are configured to generate a surface wave directed towards the backside of the substrate, improving processing capabilities.

Career Highlights

Taira Okabe is currently employed at ASM IP Holding B.V., where he continues to push the boundaries of technology in substrate processing. His expertise and innovative mindset have positioned him as a key player in his field.

Collaborations

Throughout his career, Taira has collaborated with notable colleagues, including Samer Banna and Akira Imai. These partnerships have fostered a creative environment that encourages the development of groundbreaking technologies.

Conclusion

Taira Okabe's contributions to substrate processing technology exemplify his dedication to innovation. His patents and collaborations reflect a commitment to advancing the industry and improving processing techniques.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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