This inventor holds 2 USPTO granted patents. Top assignee: Olympus Optical Company, Ltd.. Active years: 1979-1980.
Company Filing History:
Years Active: 1979-1980
Title: Taichi Banno: Innovator in Ion Activity Measurement
Introduction
Taichi Banno is a notable inventor based in Hachioji, Japan. He has made significant contributions to the field of ion activity measurement, holding 2 patents that showcase his innovative approach to scientific measurement techniques.
Latest Patents
Banno's latest patents include a "Method for Measuring Ion Activity" and an "Apparatus for Measuring Ion Activity." In the method, ion activity is measured by placing a cup filled with a test solution on a cup receiver. The process involves lifting a cup lifting arm to engage the cup receiver with a rotary plate, stirring the test solution, and measuring the potential difference between a reference electrode and other electrodes. The ion activity is then indicated as a function of these potential differences. The apparatus features a reference electrode and at least one test electrode that project through an opening in a rotating plate. The cup receiver holds the test solution and is lifted into position to engage with the rotating plate while the electrodes project into the solution. A measuring circuit connected to the electrodes measures the ion activity using a reverse logarithmic amplifier.
Career Highlights
Taichi Banno is currently employed at Olympus Optical Company, Ltd., where he continues to develop innovative solutions in measurement technology. His work has contributed to advancements in the field, enhancing the accuracy and efficiency of ion activity measurements.
Collaborations
Banno has collaborated with notable coworkers such as Tadao Yamamoto and Kiyozo Koshiishi, further enriching his work through shared expertise and insights.
Conclusion
Taichi Banno's contributions to ion activity measurement reflect his dedication to innovation and scientific advancement. His patents not only demonstrate his technical skills but also his commitment to improving measurement methodologies.
