Tai Hyeop Lho

Title: Inventor Tai Hyeop Lho: Pioneering Advancements in Point Etching Technology

Introduction

Tai Hyeop Lho is an innovative inventor based in Seoul, South Korea, recognized for his contributions to the field of plasma technology. With a focused effort on enhancing etching processes, he has successfully secured a patent that aims to improve the precision of point etching modules.

Latest Patents

Tai Hyeop Lho holds one patent titled "Point Etching Module Using Annular Surface Dielectric Barrier Discharge Apparatus and Method for Control Etching Profile of Point Etching Module." This invention discloses a point etching module that employs an annular surface-discharge plasma apparatus. The design incorporates a plate-shaped dielectric, a circular electrode on the upper surface, and an annular electrode on the lower surface that creates a gas receiving space. A power supplier applies high voltage between electrodes, which initiates electric discharge and produces filament-type plasma directed towards the substrate. This innovative approach significantly enhances control over the etching profile, benefiting various applications.

Career Highlights

Tai Hyeop Lho works at the Korea Institute of Fusion Energy, where he contributes to cutting-edge research in plasma applications. His work in developing advanced etching techniques stands out as a vital part of his career, showcasing his commitment to engineering and technology advancement.

Collaborations

Throughout his journey, Tai has collaborated with prominent colleagues such as Dong Chan Seok and Yong Ho Jung. These partnerships have further enriched his research, fostering a collaborative environment for innovation in plasma technologies.

Conclusion

With his innovative patent and ongoing contributions at the Korea Institute of Fusion Energy, Tai Hyeop Lho exemplifies the drive for progress in the field of plasma etching technology. His efforts continue to inspire future breakthroughs and improvements, making a lasting impact on the industry.