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For the Inventor, By the Inventor

Chappaqua, NY, United States of America

Tai-Hon P Chang

This inventor holds 6 USPTO granted patents. Top assignee: International Business Machines Corporation. Active years: 1976-1992.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tai-Hon P Chang. Retrieved from https://idiyas.com/inventor/tai-hon-p-chang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 6

% Patents Active = 100.0

Average Co-Inventor Count = 2.3

ph-index = 5

Forward Citations = 136(Granted Patents)


Company Filing History:

goldMedal6 out of 166,351 
 
International Business Machines Corporation
 patents

Years Active: 1976-1992

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6 patents (USPTO):Explore Patents
1. 5155412 - Method for selectively scaling a field emission electron gun and device (1992-10-13),
2. 5122663 - Compact, integrated electron beam imaging system (1992-06-16),
3. 4621232 - Inspection of unsintered single layer or multilayer ceramics using a (1986-11-04),
4. 4477729 - Continuously writing electron beam stitched pattern exposure system (1984-10-16),
5. 4426583 - Electron beam potential switching apparatus (1984-01-17),
6. 3956635 - Combined multiple beam size and spiral scan method for electron beam (1976-05-11),

Title: Innovations of Tai-Hon P Chang

Introduction

Tai-Hon P Chang is a notable inventor based in Chappaqua, NY. He has made significant contributions to the field of electron beam technology, holding a total of 6 patents. His work focuses on enhancing the efficiency and functionality of electron sources and imaging systems.

Latest Patents

One of his latest patents is titled "Method for selectively scaling a field emission electron gun and device." This invention outlines a method for scaling the dimensions of a field emission electron gun, which includes a field emission tip and a dual electrode immersion lens. The design features a well-defined circular hole at the center of each electrode and dielectric layer, allowing for precise control over the scaling factors applied to the electrodes.

Another significant patent is the "Compact, integrated electron beam imaging system." This system describes an electron beam imaging setup where a sharp-tip electron source generates an electron flow directed towards a conductive target. The system incorporates a planar, electrostatic lens that enhances the imaging capabilities while ensuring that secondary electrons emitted from the target can be detected without obstruction.

Career Highlights

Tai-Hon P Chang is currently employed at International Business Machines Corporation (IBM), where he continues to innovate in the field of electron technology. His work has been instrumental in advancing the capabilities of electron beam systems, making them more compact and efficient.

Collaborations

Throughout his career, Tai-Hon has collaborated with esteemed colleagues such as Dieter P Kern and Fritz-Jurgen Hohn. These collaborations have contributed to the development of cutting-edge technologies in the field.

Conclusion

Tai-Hon P Chang's contributions to electron beam technology through his innovative patents and work at IBM highlight his significant role in advancing this field. His inventions continue to pave the way for future developments in electron imaging systems.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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