This inventor holds 1 USPTO granted patent. Top assignee: Korea Research Institute of Chemical Technology. Active years: 2006.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2006
Title: Taek Seung Yang: Copper Thin-Film Deposition Innovation.
Introduction
Taek Seung Yang is an inventor based in Daejeon, South Korea. His work includes research into materials and processes for producing copper thin films.
Latest Patents
Yang is associated with one patent, titled “Volatile Copper Aminoalkoxide Complex and Deposition of Copper Thin Film Using Same.” The invention describes a volatile copper aminoalkoxide complex intended for use in metal-organic chemical vapor deposition (MOCVD). The disclosed approach aims to produce copper thin films with improved quality. The complex’s substituents are independently selected alkyl groups that may carry fluorine substituents, and the specified value of *m* ranges from 1 to 3. Yang’s patent portfolio includes 1 patent.
Career Highlights
Yang works at the Korea Research Institute of Chemical Technology, a research institution in South Korea. His patent reflects work on precursor chemistry and thin-film deposition.
Collaborations
Yang’s listed coworkers include Taek-Mo Chung and Yunsoo Kim. Their names are associated with the same research and patent context.
Conclusion
Taek Seung Yang’s patent focuses on a copper aminoalkoxide precursor for MOCVD, highlighting his contribution to research on copper thin-film deposition at the Korea Research Institute of Chemical Technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile