Osan, South Korea

Taehoon Lee

This inventor holds 1 USPTO granted patent. Top assignee: Semes Co., Ltd.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Taehoon Lee. Retrieved from https://idiyas.com/inventor/taehoon-lee-5lszkjgg

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Taehoon Lee: Innovator in Substrate Processing Technology

Introduction

Taehoon Lee is a notable inventor based in Osan, South Korea. He has made significant contributions to the field of substrate processing technology. His innovative work has led to the development of a unique patent that enhances the efficiency of substrate processing.

Latest Patents

Taehoon Lee holds a patent for a "Substrate processing apparatus and substrate processing method." This apparatus includes a substrate supporter that supports a substrate, along with a processing solution supply apparatus designed to deliver a processing solution onto the substrate. The processing solution supply apparatus features a trap tank for storing the processing solution, a supply line for delivering the solution, and a vent line for discharging any bubbles or gases. Additionally, it includes a static charge measurement unit to assess the static charge of the processing solution.

Career Highlights

Taehoon Lee is currently employed at Semes Co., Ltd., where he continues to innovate in substrate processing technologies. His work has been instrumental in advancing the capabilities of substrate processing equipment.

Collaborations

Taehoon Lee collaborates with Youngjun Son, contributing to the development of cutting-edge technologies in their field.

Conclusion

Taehoon Lee's contributions to substrate processing technology exemplify the impact of innovative thinking in engineering. His patent reflects a commitment to improving processing methods, showcasing his role as a key inventor in this domain.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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