Cheongju, South Korea

Taegun Kim

This inventor holds 1 USPTO granted patent. Top assignee: Korea Research Institute of Standards and Science. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Taegun Kim. Retrieved from https://idiyas.com/inventor/taegun-kim-ool2knum

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: Taegun Kim: Innovator in Nano Measurement Calibration

Introduction

Taegun Kim is a prominent inventor based in Cheongju-si, South Korea. He has made significant contributions to the field of nano measurement calibration. His innovative approach has led to the development of a unique method that enhances the accuracy of measurements at the nanoscale.

Latest Patents

Taegun Kim holds a patent for a "Method for calibrating nano measurement scale and standard material used therein." This patent outlines a systematic approach to calibrating a nano measurement scale using a standard material. The method involves measuring the widths of various nanostructures with certified values, determining the measured values based on a predetermined criterion, and calibrating the microscope's measurement scale accordingly.

Career Highlights

Taegun Kim is affiliated with the Korea Research Institute of Standards and Science. His work at this esteemed institution has allowed him to focus on advancing measurement standards and techniques. His dedication to precision and innovation has positioned him as a key figure in the field.

Collaborations

Some of Taegun Kim's notable coworkers include Kyung Joong Kim and Gyea Young Kwak. Their collaborative efforts contribute to the ongoing research and development in measurement science.

Conclusion

Taegun Kim's contributions to nano measurement calibration exemplify the importance of innovation in scientific research. His patented method not only enhances measurement accuracy but also sets a standard for future advancements in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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