Anyang-si, South Korea

Tae Young Oh

USPTO Granted Patents = 24 

Average Co-Inventor Count = 2.0

ph-index = 4

Forward Citations = 25(Granted Patents)


Location History:

  • Gyongki-do, KR (2009)
  • Anyang-si, KR (2008 - 2014)
  • Gyeonggi-do, KR (2008 - 2015)
  • Paju-si, KR (2010 - 2019)

Company Filing History:


Years Active: 2008-2019

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24 patents (USPTO):

Title: The Innovative Mind of Tae Young Oh: A Leader in Washing Device Technology

Introduction: Tae Young Oh is an accomplished inventor based in Anyang-si, South Korea, holding an impressive portfolio of 24 patents. His innovative contributions have significantly advanced technology in various sectors, particularly in the development of washing devices that enhance the efficiency and effectiveness of substrate cleaning.

Latest Patents: One of Tae Young Oh's most notable recent inventions is a sophisticated washing device designed to prevent substrate damage caused by drooping. This cutting-edge washing device incorporates a plasma irradiating component, allowing for dirt removal via plasma irradiation. It features a multi-stage process including a dirt washing section, a finishing washing section, and a drying component. Notably, the design also includes a floating unit that keeps the substrate in a suspended state during the cleaning process, ensuring thorough cleanliness without the risk of damage.

Career Highlights: Throughout his career, Tae Young Oh has made significant strides in the field of display technology. He has worked with prominent companies such as LG Display Co., Ltd. and LG Philips LCD Co., Inc., where he has contributed to various projects and innovations that align with his expertise.

Collaborations: Tae Young Oh has collaborated with distinguished colleagues in the field, including Chul Ho Kim and Jung Jae Lee. These collaborations have fostered an environment of innovation and have led to the successful development of groundbreaking technologies.

Conclusion: Tae Young Oh's contributions to the realm of washing device technology showcase his innovative spirit and dedication to enhancing industry standards. With a strong foundation in patent development and collaboration with talented peers, he continues to play a vital role in shaping the future of substrate cleaning technologies. The impact of his work is poised to influence the industry for years to come.

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