The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 07, 2016

Filed:

Sep. 29, 2009
Applicants:

Tae Young OH, Paju-si, KR;

Eun Ha Lee, Paju-si, KR;

Inventors:

Tae Young Oh, Paju-si, KR;

Eun Ha Lee, Paju-si, KR;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B08B 3/00 (2006.01); H01L 21/67 (2006.01); B08B 7/00 (2006.01); H01L 21/677 (2006.01); H01L 21/683 (2006.01); B08B 3/10 (2006.01); G02F 1/13 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67034 (2013.01); B08B 3/10 (2013.01); B08B 7/0035 (2013.01); H01L 21/67028 (2013.01); H01L 21/67051 (2013.01); H01L 21/6776 (2013.01); H01L 21/67115 (2013.01); H01L 21/6838 (2013.01); G02F 2001/1316 (2013.01);
Abstract

A washing device is disclosed, which is capable of preventing damage of a substrate caused by drooping of the substrate. The washing device includes a plasma irradiating part supplied with a substrate from a substrate loading part to remove dirt from the substrate by irradiating plasma to the substrate; a dirt washing part supplied from the substrate from the plasma irradiating part to remove dirt remaining on the substrate; a finishing washing part supplied with the substrate from the dirt washing part to wash the substrate; a drying part supplied with the substrate from the finishing washing part to dry the substrate; and a substrate unloading part supplied with the substrate from the drying part to unload the substrate, wherein the plasma irradiating part includes a plasma irradiation unit that irradiates plasma to the substrate and a floating unit that maintains the substrate in a floating state.


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