Gyeonggi-do, South Korea

Tae-Yeon Jung

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Skhynix Inc.. Active years: 2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tae-Yeon Jung. Retrieved from https://idiyas.com/inventor/tae-yeon-jung

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 10.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: Innovations by Tae-Yeon Jung

Introduction

Tae-Yeon Jung is a notable inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of semiconductor technology. His innovative work has led to the development of a unique surface treatment method for semiconductor devices.

Latest Patents

Tae-Yeon Jung holds a patent for a surface treatment method for semiconductor devices. This method involves providing a substrate with a plurality of projected patterns. It includes forming a hydrophobic coating layer on the surface of each projected pattern, rinsing the substrate with deionized water, and drying it. The hydrophobic coating layer is created using a coating agent that contains phosphate or phosphonate with multiple hydrocarbon groups.

Career Highlights

Tae-Yeon Jung is currently employed at SK Hynix Inc., a leading company in the semiconductor industry. His work at SK Hynix has allowed him to focus on advancing semiconductor technologies and improving manufacturing processes.

Collaborations

He has collaborated with notable colleagues, including Hyo-Sang Kang and Sung-Ki Park. These collaborations have contributed to the success of various projects within the company.

Conclusion

Tae-Yeon Jung's innovative contributions to semiconductor technology highlight his expertise and dedication to advancing the field. His patent for a surface treatment method showcases his ability to develop practical solutions for complex challenges in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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