The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 13, 2016
Filed:
Feb. 19, 2016
SK Hynix Inc., Gyeonggi-do, KR;
Sung-Hyuk Cho, Gyeonggi-do, KR;
Hyo-Sang Kang, Gyeonggi-do, KR;
Sung-Ki Park, Gyeonggi-do, KR;
Kwon Hong, Gyeonggi-do, KR;
Hyung-Soon Park, Gyeonggi-do, KR;
Hyung-Hwan Kim, Gyeonggi-do, KR;
Young-Bang Lee, Gyeonggi-do, KR;
Ji-Hye Han, Gyeonggi-do, KR;
Tae-Yeon Jung, Gyeonggi-do, KR;
Hyeong-Jin Nor, Gyeonggi-do, KR;
SK Hynix Inc., Gyeonggi-do, KR;
Abstract
A surface treatment method for a semiconductor device includes providing a substrate where a plurality of projected patterns are formed, forming a hydrophobic coating layer on a surface of each of the plurality of projected patterns, rinsing the substrate with deionized water, and drying the substrate, wherein the hydrophobic coating layer is formed using a coating agent that includes phosphate having more than one hydrocarbon group, phosphonate having more than one hydrocarbon group, or a mixture thereof.