Tae-Moon Jeong

Title: Innovations of Tae-Moon Jeong in Photolithography

Introduction

Tae-Moon Jeong is a prominent inventor based in Yongin, South Korea. He has made significant contributions to the field of photolithography, particularly in the development of masks used for measuring flare in projection lenses. With a total of 4 patents to his name, his work has advanced the precision and effectiveness of photolithographic processes.

Latest Patents

Tae-Moon Jeong's latest patents include several innovative methods and devices. These patents encompass a mask for use in measuring flare, a method of manufacturing the mask, a method of identifying flare-affected regions on a wafer, and a method for designing new masks to correct for flare. His inventions provide a comprehensive approach to quantifying flare produced by projection lenses, enabling the identification of flare-affected regions on wafers. This process allows for the formation of uniform photoresist patterns by calculating the effective amount of flare in affected regions. Additionally, he has developed a photomask that includes a substrate and measuring patterns to obtain precise measurements of focus and lens aberrations in exposure systems.

Career Highlights

Tae-Moon Jeong is currently employed at Samsung Electronics Co., Ltd., where he continues to innovate in the field of photolithography. His work has been instrumental in enhancing the capabilities of photolithographic systems, which are crucial for semiconductor manufacturing.

Collaborations

Some of his notable coworkers include Seong-Woon Choi and Won-Tai Ki, who have collaborated with him on various projects within the company.

Conclusion

Tae-Moon Jeong's contributions to photolithography through his innovative patents and work at Samsung Electronics Co., Ltd. highlight his significant role in advancing technology in this field. His inventions not only improve the accuracy of photolithographic processes but also pave the way for future advancements in semiconductor manufacturing.