Company Filing History:
Years Active: 2010-2013
Title: The Innovative Mind of Tae (Mark) H Chung
Introduction
Tae (Mark) H Chung, an accomplished inventor based in Murrieta, CA, is recognized for his significant contributions to the field of laser technology. With a total of three patents to his name, Chung is known for his innovative approaches and solutions that enhance laser systems' performance and efficiency.
Latest Patents
Chung's latest patents revolve around the development of extendable electrodes for gas discharge lasers. His first patent describes a movable electrode assembly for use in laser systems, showcasing a design that includes a first electrode with a discharge surface opposite to a second electrode. This configuration allows for effective adjustment of the discharge gap between the two electrodes, facilitated by a discharge gap adjuster. This invention not only defines the spatial relationship between the electrodes but also provides a method for adjusting the discharge gap, thereby optimizing laser performance.
In a repeated innovative approach, his second patent mirrors the principles outlined in the first patent, emphasizing the significance of a structured discharge gap for efficient energy transfer in laser operations. The incorporation of a mechanism for movable adjustment supports expansion in the versatility of laser systems, showcasing Chung's commitment to advancing the field.
Career Highlights
Tae (Mark) H Chung has made substantial strides in his career, particularly through his work at Cymer, Inc., a leader in the innovation of laser technology. His focus on improving gas discharge systems illustrates his dedication to enhancing industry standards and performance metrics.
Collaborations
Throughout his career, Chung has collaborated with notable colleagues such as Richard L Sandstrom and Richard C Ujazdowski. These collaborations have fostered a dynamic and innovative work environment, contributing to significant advancements in their projects and collective expertise in laser technologies.
Conclusion
In conclusion, Tae (Mark) H Chung's innovative spirit and dedication to enhancing laser technology have positioned him as a key inventor in his field. With multiple patents that contribute to the advancement of gas discharge lasers, his work continues to influence the industry and inspire future innovations. Through collaboration with esteemed colleagues at Cymer, Inc., Chung's contributions are poised to leave a lasting impact on the future of laser systems.