Hyogo, Japan

Tadashi Nishioka

This inventor holds 33 USPTO granted patents, primarily in Semiconductor Fabrication. Top assignees: Mitsubishi Denki Kabushiki Kaisha, Ryoden Semiconductor System Engineering Corporation, Ryoden Semiconductor Systems Engineering Corporation. Active years: 1984-1998.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tadashi Nishioka. Retrieved from https://idiyas.com/inventor/tadashi-nishioka

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.4

ph-index = 12

Forward Citations = 440(Granted Patents)


Location History:

  • Itami City, JP (1989)
  • Itami, JP (1984 - 1998)
  • Hyogo, JP (1990 - 1998)

Company Filing History:


Years Active: 1984-1998

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Areas of Expertise:
Photosensitive Resin
Thin Film Property
Photoresist Coating
Atomic Force Microscope
Scanning Probe Microscope
Semiconductor Wafer Inspection
Electrode Formation
Pattern Transfer Mask
Failure Analysis
Silicon Nitride Treatment
Blistered Film Identification
Coarse Adjusting Device
33 patents (USPTO):Explore Patents

Title: Innovations by Tadashi Nishioka: A Pioneer in Semiconductor Technology

Introduction

Tadashi Nishioka, based in Hyogo, Japan, is an accomplished inventor known for his substantial contributions to the field of semiconductor technology. With a portfolio that includes 33 patents, Nishioka has played a pivotal role in advancing innovative methods and technologies that improve efficiency and reliability in semiconductor manufacturing processes.

Latest Patents

Nishioka's latest patents are noteworthy for their ingenuity and practical application. One patent is a **Method of Removing Photosensitive Resin**, which offers an effective solution for removing photosensitive resins used as photoresists in etching processes, particularly for aluminum films. This method utilizes a mixed gas comprising fluorine compound gas and steam, which is then excited with microwaves to facilitate the gasification of the resin. This innovation not only enhances the removal process but also improves the durability of the apparatus involved.

Another significant patent is the **Contamination Evaluating Apparatus**, designed to assess semiconductor wafers. This apparatus features a fixed sample placement portion and incorporates a piezoelectric element to accurately position samples. Additionally, it includes integrated light collecting and receiving portions, which allow for precise detection and analysis of contaminant types and locations. This invention simplifies the apparatus's size while ensuring a reliable evaluation of contamination, boosting the overall effectiveness of semiconductor manufacturing processes.

Career Highlights

During his career, Tadashi Nishioka has worked with prominent organizations, including Mitsubishi Electric Corporation and Ryoden Semiconductor System Engineering Corporation. These roles have provided him with the platform to develop and refine his patented technologies in collaboration with industry leaders.

Collaborations

Nishioka has collaborated with notable professionals in his field, including Hiroshi Koyama and Takao Yasue. Their partnerships have facilitated the exchange of ideas and expertise, allowing for the enhancement of innovations in semiconductor technologies.

Conclusion

Tadashi Nishioka’s inventive work is a testament to the impact that dedicated inventors can have on technology and industry. Through his numerous patents, he has contributed significantly to semiconductor manufacturing efficiency and effectiveness, showcasing the importance of innovation in driving technological progress.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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