Location History:
- Tokyo, JP (2009)
- Minato-ku, JP (2009)
- Beaverton, OR (US) (2015)
- Miyagi, JP (2014 - 2017)
Company Filing History:
Years Active: 2009-2017
Title: The Innovative Contributions of Tadashi Kotsugi
Introduction
Tadashi Kotsugi is a prominent inventor based in Miyagi, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 7 patents. His work focuses on advanced etching techniques and methods for semiconductor device manufacturing.
Latest Patents
One of Kotsugi's latest patents is an etching apparatus designed to control a high-frequency power supply. This apparatus is capable of etching a polymer layer formed on a base layer using plasma generated from a predetermined gas. The polymer layer consists of a periodic pattern of two different polymers that self-assemble, allowing for precise etching of the base layer. Another notable patent is a semiconductor device manufacturing method that includes a film-forming step and a plasma etching step. This method selectively removes silicon-containing layers while preserving the integrity of the silicon nitride or silicon oxide layers.
Career Highlights
Kotsugi is currently employed at Tokyo Electron Limited, a leading company in the semiconductor industry. His innovative work has contributed to advancements in semiconductor manufacturing processes, enhancing efficiency and precision.
Collaborations
Kotsugi has collaborated with notable colleagues such as Eiichi Nishimura and Takashi Fuse. Their combined expertise has fostered a productive environment for innovation and development in semiconductor technologies.
Conclusion
Tadashi Kotsugi's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence advancements in manufacturing processes, showcasing the importance of innovation in technology.