Isehara, Japan

Tadao Okabe

This inventor holds 1 USPTO granted patent. Top assignee: Fujitsu Corporation. Active years: 1992.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tadao Okabe. Retrieved from https://idiyas.com/inventor/tadao-okabe-qik02wq3

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 1992

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1 patent (USPTO):Explore Patents

Title: Tadao Okabe: Innovator in Semiconductor Fabrication

Introduction

Tadao Okabe is a prominent inventor based in Isehara, Japan. He has made significant contributions to the field of semiconductor technology. His innovative methods have paved the way for advancements in the fabrication of semiconductor devices.

Latest Patents

Tadao Okabe holds 1 patent for his invention titled "Method for fabricating a semiconductor device." This patent describes a method for fabricating a compound semiconductor device that includes a semi-insulating layer made from a group III-V compound semiconductor material containing arsenic. The method involves growing the semi-insulating layer from a source gas that contains both arsine and an organic compound of arsenic. This simultaneous use of arsine and the organic compound allows for achieving a desired high resistivity in the semi-insulating layer.

Career Highlights

Tadao Okabe is associated with Fujitsu Corporation, where he applies his expertise in semiconductor technology. His work has been instrumental in enhancing the performance and efficiency of semiconductor devices.

Collaborations

Some of Tadao Okabe's notable coworkers include Masahiko Takikawa and Toshihide Kikkawa. Their collaborative efforts contribute to the innovative environment at Fujitsu Corporation.

Conclusion

Tadao Okabe's contributions to semiconductor fabrication highlight his role as a key innovator in the industry. His patented methods continue to influence the development of advanced semiconductor technologies.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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