This inventor holds 3 USPTO granted patents and 1 EPO patent. Top assignees: Nikon Corporation, Central Glass Company, Limited. Active years: 1997-2019.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Tokyo, JP (1997)
- Yokohama, JP (2017 - 2019)
Company Filing History:
Years Active: 1997-2019
Title: **Innovator Tadahiko Saito: Pioneering Patents in Thin Film Technology**
Introduction
Tadahiko Saito, based in Tokyo, Japan, is recognized for his significant contribution to the field of thin film technology. With one patent to his name, Saito has demonstrated his expertise in innovative methods that enhance the effectiveness and efficiency of reactive DC sputtering processes. His work is noteworthy within the industry, and he continues to be an integral part of advancements in this area.
Latest Patents
Saito's notable patent is titled "Method of forming thin film on substrate by reactive DC sputtering". This innovative method outlines how to create a metal oxide film on a substrate using a reactive DC sputtering device, which incorporates both a reaction gas and an inert gas. The process involves carefully controlling the flow rate or pressure ratio of these gases to achieve optimal results. Specifically, it includes regulating these ratios to not exceed 0.4 and manipulating power inputs to maintain the desired discharge voltage, thereby suppressing unwanted metal formation on the substrate. This method is vital for enhancing the quality of thin films used in various applications.
Career Highlights
Saito is affiliated with Central Glass Company, Limited, a firm renowned for its advancements in glass and related materials. His career at the company has been marked by innovative practices and a commitment to research that pushes the boundaries of existing thin film technologies. Saito's contributions not only highlight his inventiveness but also reflect his dedication to the field.
Collaborations
Throughout his career, Saito has collaborated with esteemed colleagues such as Masayuki Yamada and Akira Ishikawa. These partnerships have fostered an environment of creativity and shared knowledge, ultimately enhancing the impact of their collective work in thin film technology.
Conclusion
Tadahiko Saito stands out as an inventor who brings valuable innovations to the realm of thin film formation. His patent on the reactive DC sputtering method establishes him as a key player in advancing technologies that have widespread implications in various industries. Through his ongoing work at Central Glass Company, Limited, and collaborations with fellow innovators, Saito is set to inspire future breakthroughs in this critical area of research.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile