Zhudong, Taiwan

Ta-Ching Hsiao

USPTO Granted Patents = 5 

Average Co-Inventor Count = 4.6

ph-index = 1


Location History:

  • Zhudong Township, TW (2018 - 2021)
  • Zhudong Township, Hsinchu County, TW (2023)

Company Filing History:


Years Active: 2018-2023

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5 patents (USPTO):Explore Patents

Title: Innovations by Ta-Ching Hsiao in Boron Removal Technologies

Introduction

Ta-Ching Hsiao is a prominent inventor based in Zhudong, Taiwan, known for his significant contributions to the field of materials science. With a total of five patents to his name, Hsiao has focused on developing methods for the effective removal of boron, which is crucial in various industrial applications.

Latest Patents

Among his latest innovations are two patents for an "Apparatus for Removing Boron" and a "Method for Removing Boron." Both patents outline a comprehensive method that involves mixing carbon and silicon source materials to create a solid-state mixture. The process further includes heating this mixture to temperatures between 1000°C and 1600°C while adjusting the chamber's pressure to between 1 torr and 100 torr. Hsiao's inventive approach allows for the introduction of a gas mixture, composed of a first carrier gas combined with water vapor, to efficiently extract boron during the procedure.

Career Highlights

Hsiao is currently affiliated with the Industrial Technology Research Institute (ITRI), where he conducts research and development to advance his patented technologies. His work plays a pivotal role in improving industrial processes that require precise boron removal, thereby enhancing efficiency and effectiveness in various applications.

Collaborations

Collaborating with esteemed coworkers Chu-Pi Jeng and Mu-Hsi Sung, Hsiao has contributed to a collaborative environment that fosters innovation and advancement in technology. This teamwork amplifies their collective impact on the field of materials science and helps propel research initiatives forward.

Conclusion

Ta-Ching Hsiao stands out as a leading innovator in the area of boron removal technologies. His advancements are not only significant in the realm of patents but also play a crucial role in various industries relying on effective materials processing. Hsiao's ongoing research continues to drive forward the boundaries of innovation in materials science.

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