This inventor holds 1 USPTO granted patent. Top assignee: Industrial Technology Research Institute. Active years: 2014.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2014
Title: Szu-Po Huang: Innovator in Nanometer Scale Materials
Introduction
Szu-Po Huang is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of nanotechnology, particularly in the development of methods for forming nanometer scale dot-shaped materials. His innovative approach has the potential to impact various applications in materials science and engineering.
Latest Patents
Szu-Po Huang holds a patent for a method titled "Method for forming nanometer scale dot-shaped materials." This patent describes a process that involves providing a sub-micrometer scale material and a metallo-organic compound. The method includes mixing these components in a solvent, followed by thermal decomposition of the metallo-organic compound. This process results in the formation of a plurality of nanometer scale dot-shaped materials on the sub-micrometer scale material, creating a continuous interface between the two materials.
Career Highlights
Szu-Po Huang is affiliated with the Industrial Technology Research Institute, where he conducts research and development in advanced materials. His work focuses on innovative techniques that enhance the properties and applications of nanomaterials. With a patent portfolio that includes 1 patent, he continues to push the boundaries of technology in his field.
Collaborations
Throughout his career, Szu-Po Huang has collaborated with notable colleagues, including Chun-An Lu and Hong-Ching Lin. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Szu-Po Huang is a key figure in the advancement of nanotechnology, with a focus on creating novel materials through innovative methods. His contributions are paving the way for future developments in the field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
