This inventor holds 1 USPTO granted patent. Top assignee: Hitachi, Ltd.. Active years: 2000.
Company Filing History:
Years Active: 2000
Title: Syunji Sasabe: Innovator in Plasma Processing Technology
Introduction
Syunji Sasabe is a notable inventor based in Irima, Japan. He has made significant contributions to the field of plasma processing technology. His innovative approach has led to advancements that are crucial for various applications in semiconductor manufacturing.
Latest Patents
Syunji Sasabe holds a patent for a "Method and apparatus for plasma processing." This invention provides a method of processing a sample by generating plasma through an electromagnetic wave. The process involves disposing a material containing carbon, such as silicon carbide (SiC), in a vacuum container that serves as a discharge region. The etching chamber is cleaned using O₂ cleaning treatment with a sheet-type dry etching apparatus. After controlling the inner wall temperature of the etching chamber, a sample is conveyed into the chamber. A TiN cap layer, an Al–Cu alloy layer, and a TiN barrier layer are plasma-etched sequentially using BCl₃/Cl₂/CH₄/Ar gases, with the pattern of a resist film acting as a mask. This patent showcases his expertise and innovative thinking in the field.
Career Highlights
Syunji Sasabe is associated with Hitachi, Ltd., a leading company in technology and innovation. His work at Hitachi has allowed him to explore and develop advanced technologies that enhance the efficiency and effectiveness of plasma processing.
Collaborations
Some of his notable coworkers include Katsuya Watanabe and Saburo Kanai. Their collaboration has contributed to the success of various projects and innovations within the company.
Conclusion
Syunji Sasabe's contributions to plasma processing technology exemplify the impact of innovative thinking in the field of semiconductor manufacturing. His patent and work at Hitachi, Ltd. highlight his role as a key inventor in advancing technology.