Satsuma, Japan

Syunichi Kuramoto

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Fujitsu Corporation. Active years: 2001.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Syunichi Kuramoto. Retrieved from https://idiyas.com/inventor/syunichi-kuramoto

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0


Average Co-Inventor Count = 10.0

ph-index = 1

Forward Citations = 46(Granted Patents)


Company Filing History:


Years Active: 2001

Loading Chart...
Loading Chart...
1 patent (USPTO):Explore Patents

Title: Syunichi Kuramoto: Innovator in Semiconductor Technology

Introduction

Syunichi Kuramoto is a notable inventor based in Satsuma-gun, Japan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent.

Latest Patents

Kuramoto holds a patent for a semiconductor device and a method of producing the same. This invention includes a semiconductor chip, a resin package that seals the chip, signal passages that guide the signal terminals outward, a grounding metal film in contact with the chip's bottom surface, and a grounding passage connected to the grounding metal film.

Career Highlights

He is currently employed at Fujitsu Corporation, where he continues to work on advancements in semiconductor technology. His expertise and innovative approach have positioned him as a valuable asset in his field.

Collaborations

Kuramoto has collaborated with notable colleagues, including Nobuo Ooyama and Shinichiro Maki, contributing to various projects and innovations within the company.

Conclusion

Syunichi Kuramoto's work in semiconductor technology exemplifies the impact of innovation in modern electronics. His patent reflects a commitment to advancing technology and improving device functionality.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…