Takatsuki, Japan

Syoichiro Minomo

This inventor holds 1 USPTO granted patent. Top assignee: Daihen Corporation. Active years: 1994.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Syoichiro Minomo. Retrieved from https://idiyas.com/inventor/syoichiro-minomo

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 1994

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1 patent (USPTO):Explore Patents

Title: Syoichiro Minomo: Innovator in Plasma Processing Technology

Introduction

Syoichiro Minomo is a notable inventor based in Takatsuki, Japan. He has made significant contributions to the field of plasma processing technology. His innovative work has led to the development of a unique apparatus that enhances the efficiency of plasma generation.

Latest Patents

Syoichiro Minomo holds a patent for a "Plasma processing apparatus for generating uniform strip-shaped plasma." This invention involves a plasma chamber equipped with a strip-shaped rectangular window. The apparatus is designed to process objects placed close to this window, utilizing a coupling rectangular waveguide that ensures effective microwave propagation.

Career Highlights

Minomo is associated with Daihen Corporation, where he has been instrumental in advancing plasma processing technologies. His work focuses on improving the uniformity and efficiency of plasma generation, which is crucial for various industrial applications.

Collaborations

Throughout his career, Syoichiro Minomo has collaborated with esteemed colleagues such as Akira Ishii and Michio Taniguchi. These partnerships have fostered innovation and have contributed to the success of their projects.

Conclusion

Syoichiro Minomo's contributions to plasma processing technology exemplify the impact of innovative thinking in engineering. His patent and collaborative efforts continue to influence advancements in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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