Swee-Teng Chin

Title: Swee-Teng Chin: Innovator in Polishing Technology

Introduction

Swee-Teng Chin is a notable inventor based in Pearland, TX (US). He has made significant contributions to the field of polishing technology, holding a total of 3 patents. His work focuses on enhancing the quality and efficiency of polishing processes in various materials.

Latest Patents

Chin's latest patents include a "Polishing Layer Analyzer and Method," which is designed to detect macro inhomogeneities in polymeric sheets. This analyzer classifies the sheets as either acceptable or suspect, ensuring quality control in manufacturing. Another significant patent is the "Method of Manufacturing Chemical Mechanical Polishing Pads." This method utilizes an automated inspection system to identify macro inhomogeneities in skived sheets, classifying them similarly to ensure that only acceptable sheets are processed into polishing layers for chemical mechanical polishing pads.

Career Highlights

Throughout his career, Swee-Teng Chin has worked with prominent companies such as Rohm and Haas Electronic Materials and Dow Global Technologies. His experience in these organizations has allowed him to develop innovative solutions that address industry challenges.

Collaborations

Chin has collaborated with notable professionals in his field, including Francis V Acholla and Andrew Wank. These partnerships have contributed to the advancement of polishing technologies and have fostered a collaborative environment for innovation.

Conclusion

Swee-Teng Chin's contributions to polishing technology through his patents and career achievements highlight his role as an influential inventor. His work continues to impact the industry positively, ensuring higher standards in material processing.