Company Filing History:
Years Active: 2005
Title: Suvi Päivikki Haukka: Innovator in Transition Metal Nitride Thin Films
Introduction
Suvi Päivikki Haukka is a notable inventor based in Helsinki, Finland. He has made significant contributions to the field of materials science, particularly in the deposition of transition metal nitride thin films. His innovative approach has implications for various applications in technology and manufacturing.
Latest Patents
Haukka holds a patent for a method of depositing transition metal nitride thin films. This invention involves an Atomic Layer Deposition (ALD) type process. The method utilizes a vapor-phase pulse of a source material, a reducing agent, and a nitrogen source material. These components are alternately and sequentially introduced into a reaction space, where they interact with a substrate. Notably, the reducing agent used in this process is a boron compound, which generates gaseous reaction byproducts when it reacts with the metal source material.
Career Highlights
Suvi Päivikki Haukka is associated with ASM International N.V., a company known for its advanced semiconductor equipment and materials. His work at ASM has allowed him to explore and develop innovative techniques in thin film deposition, contributing to the advancement of semiconductor technology.
Collaborations
Haukka has collaborated with notable colleagues, including Kai-Erik Elers and Ville Antero Saanila. These collaborations have fostered a productive environment for innovation and research in the field of materials science.
Conclusion
Suvi Päivikki Haukka's contributions to the field of transition metal nitride thin films exemplify the importance of innovation in technology. His patented method showcases the potential for advancements in semiconductor applications.