Susumu Ono

Title: Susumu Ono: Innovator in Electron-Beam Lithography

Introduction

Susumu Ono is a prominent inventor based in Taipei, Taiwan. He is known for his contributions to the field of electron-beam lithography, a critical technology in the manufacturing of microelectronics. His innovative methods have paved the way for advancements in precision patterning.

Latest Patents

Ono holds a patent for an "Electron-beam lithography method and system." This method involves computing and outputting a development time of a positive-tone electron-sensitive layer and a parameter recipe for an electron-beam device using a pattern dimension simulation system. The process includes performing a low-temperature treatment to chill a developer solution, utilizing an electron-beam to irradiate an exposure region of the positive-tone electron-sensitive layer based on the parameter recipe, and employing the chilled developer solution to develop a development region of the positive-tone electron-sensitive layer according to the development time. This innovative approach allows for more accurate control of the development pattern dimensions and can shrink the minimum dimension of the development pattern.

Career Highlights

Susumu Ono is affiliated with National Taiwan University, where he continues to engage in research and development in the field of electron-beam lithography. His work has significantly impacted the microelectronics industry, enhancing the capabilities of lithography techniques.

Collaborations

Ono collaborates with notable colleagues, including Hsiu-Yun Yeh and Li-Cheng Chang. Their combined expertise contributes to the advancement of research in electron-beam lithography and related technologies.

Conclusion

Susumu Ono's innovative work in electron-beam lithography exemplifies the importance of precision in modern technology. His contributions continue to influence the field and inspire future advancements.