This inventor holds 2 USPTO granted patents and 2 EPO patents. Top assignee: Central Glass Company, Limited. Active years: 2013-2014.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Ube, JP (2013)
- Kawasaki, JP (2014)
Company Filing History:
Years Active: 2013-2014
Title: Susumu Inoue: Innovator in Fluorine-Containing Polymers
Introduction
Susumu Inoue is a notable inventor based in Kawasaki, Japan. He has made significant contributions to the field of polymer chemistry, particularly in the development of fluorine-containing polymers. With a total of 2 patents, Inoue's work has implications in various industrial applications.
Latest Patents
Inoue's latest patents include a fluorine-containing polymer and an anti-static agent wherein the polymer is utilized. This fluorine-containing polymer features a repeating unit of a specific general formula and is produced through homopolymerization or copolymerization with other polymerizable double bond-containing monomers. Additionally, he has developed an acid with a fluorine-containing carbanion structure, which is represented by another general formula. This innovation is particularly relevant for photoacid generators used in chemically amplified resist materials, enhancing sensitivity to ArF excimer laser light.
Career Highlights
Inoue is currently employed at Central Glass Company, Limited, where he continues to advance his research in polymer chemistry. His work has garnered attention for its potential applications in various industries, including electronics and materials science.
Collaborations
Inoue has collaborated with notable colleagues such as Takashi Kume and Haruhiko Komoriya. Their combined expertise has contributed to the successful development of innovative materials and technologies.
Conclusion
Susumu Inoue's contributions to the field of polymer chemistry, particularly through his patents, highlight his role as an influential inventor. His work continues to impact various industries, showcasing the importance of innovation in material science.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
