The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 12, 2013
Filed:
Mar. 10, 2009
Masashi Nagamori, Fujimino, JP;
Satoru Narizuka, Saitama, JP;
Susumu Inoue, Ube, JP;
Takashi Kume, Kawagoe, JP;
Masashi Nagamori, Fujimino, JP;
Satoru Narizuka, Saitama, JP;
Susumu Inoue, Ube, JP;
Takashi Kume, Kawagoe, JP;
Central Glass Company, Limited, Ube-shi, JP;
Abstract
There is provided an acid having a fluorine-containing carbanion structure or a salt having a fluorine-containing carbanion structure, which is represented by the following general formula (1). By using a photoacid generator for chemically amplified resist materials that generates this acid, it is possible to provide a photoacid generator which has a high sensitivity to the ArF excimer laser light or the like, of which acid (photo generated acid) to be generated has a sufficiently high acidity, and which has a high dissolution in resist solvent and a superior compatibility with resin, and a resist material containing such a photoacid generator.