Company Filing History:
Years Active: 2007-2012
Title: Inventor Spotlight: Susie Xiuru Yang
Introduction
Susie Xiuru Yang, a talented inventor based in Sunnyvale, California, has made significant contributions to the field of technology through her innovative work. With four patents to her name, she is recognized for her expertise in advanced materials and patterning techniques. Her accomplishments exemplify the impact of visionary inventors in driving technological advancements.
Latest Patents
Susie Yang's recent patents showcase her ingenuity in the realm of lithography and etching technologies. One of her latest patents, "Double Exposure Patterning with Carbonaceous Hardmask," details methods to pattern features on a substrate layer by exposing a photoresist layer multiple times. By implementing an overlay offset between successive exposures, her methods significantly enhance the performance of lithography tools, decreasing the half pitch of reticles used in 65 nm generation equipment to achieve 45 nm performance.
Another notable patent, "Methods and Apparatus for Measuring Thickness of Etching Residues on a Substrate," presents a sophisticated method for determining the thickness of residue layers post-etching. The process involves taking optical scatterometry measurements before and after cleaning procedures. By calculating the difference between these measurements and applying dispersion models, the method provides a reliable way to assess residual thickness on substrates.
Career Highlights
Currently, Susie Yang is employed at Applied Materials, Inc., a leader in materials engineering solutions. With a strong focus on innovation and development, she plays a crucial role in enhancing the performance and reliability of technologies used in the semiconductor industry. Her commitment to research and development has been instrumental in advancing the company's objectives and maintaining its competitive edge.
Collaborations
Throughout her career, Susie has collaborated with esteemed colleagues, including Michael Duane and Michael C. Smayling. Working alongside such talented professionals has enabled her to combine expertise and insights, driving forward innovative solutions and achieving notable advancements in their field.
Conclusion
Susie Xiuru Yang's contributions as an inventor reflect her dedication to technological progress and innovation. Her patents not only mark significant achievements in the industry but also highlight the essential role of inventors in shaping the future of technology. Her work at Applied Materials, Inc. continues to inspire and pave the way for future advancements in the ever-evolving landscape of materials engineering.